Enhanced electron field emission from oriented columnar AIN and mechanism

A. P. Huang; Paul K. Chu; X. L. Wu

doi:10.1063/1.2216353

Enhanced electron field emission from oriented columnar AIN and mechanism

A. P. Huang
, Paul K. Chu
, X. L. Wu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

8 Citations (Scopus)

Abstract

(002) oriented AlN thin films with a columnar microstructure fabricated by vapor phase deposition with a sample bias exhibit excellent field emission properties. The field emission current density increases with smaller film thickness, and at a thickness of 400 nm, the current density reaches 9.9 μA/cm² and the turn-on field is close to 5 V/μm. Atomic force microscopy discloses nanoscale protrusions on the surface that greatly expand the emission area and efficiency. The Fowler-Nordheim plot reveals a linear dependence under low electric field (

Original language	English
Article number	251103
Journal	Applied Physics Letters
Volume	88
Issue number	25
DOIs	https://doi.org/10.1063/1.2216353
Publication status	Published - 19 Jun 2006

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title = "Enhanced electron field emission from oriented columnar AIN and mechanism",

abstract = "(002) oriented AlN thin films with a columnar microstructure fabricated by vapor phase deposition with a sample bias exhibit excellent field emission properties. The field emission current density increases with smaller film thickness, and at a thickness of 400 nm, the current density reaches 9.9 μA/cm2 and the turn-on field is close to 5 V/μm. Atomic force microscopy discloses nanoscale protrusions on the surface that greatly expand the emission area and efficiency. The Fowler-Nordheim plot reveals a linear dependence under low electric field (",

author = "Huang, \{A. P.\} and Chu, \{Paul K.\} and Wu, \{X. L.\}",

year = "2006",

month = jun,

day = "19",

doi = "10.1063/1.2216353",

language = "English",

volume = "88",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Enhanced electron field emission from oriented columnar AIN and mechanism

AU - Huang, A. P.

AU - Chu, Paul K.

AU - Wu, X. L.

PY - 2006/6/19

Y1 - 2006/6/19

N2 - (002) oriented AlN thin films with a columnar microstructure fabricated by vapor phase deposition with a sample bias exhibit excellent field emission properties. The field emission current density increases with smaller film thickness, and at a thickness of 400 nm, the current density reaches 9.9 μA/cm2 and the turn-on field is close to 5 V/μm. Atomic force microscopy discloses nanoscale protrusions on the surface that greatly expand the emission area and efficiency. The Fowler-Nordheim plot reveals a linear dependence under low electric field (

AB - (002) oriented AlN thin films with a columnar microstructure fabricated by vapor phase deposition with a sample bias exhibit excellent field emission properties. The field emission current density increases with smaller film thickness, and at a thickness of 400 nm, the current density reaches 9.9 μA/cm2 and the turn-on field is close to 5 V/μm. Atomic force microscopy discloses nanoscale protrusions on the surface that greatly expand the emission area and efficiency. The Fowler-Nordheim plot reveals a linear dependence under low electric field (

UR - https://www.scopus.com/pages/publications/33745475057

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-33745475057&origin=recordpage

U2 - 10.1063/1.2216353

DO - 10.1063/1.2216353

M3 - RGC 21 - Publication in refereed journal

SN - 0003-6951

VL - 88

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 25

M1 - 251103

ER -

Enhanced electron field emission from oriented columnar AIN and mechanism

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