Enhanced dielectric permittivity and relaxor behavior in thermally annealed P(VDF-TrFE) copolymer films

S. Nayak; Ho Tin Ng; A. Pramanick

doi:10.1063/5.0010569

Enhanced dielectric permittivity and relaxor behavior in thermally annealed P(VDF-TrFE) copolymer films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Overview

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Author(s)

S. Nayak
Ho Tin Ng
A. Pramanick

Related Research Unit(s)

Department of Materials Science and Engineering

Detail(s)

Original language	English
Article number	232903
Journal / Publication	Applied Physics Letters
Volume	117
Issue number	23
Online published	10 Dec 2020
Publication status	Published - Dec 2020

Link(s)

DOI	DOI https://doi.org/10.1063/5.0010569 Final Published version
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Attachment(s)	Documents 72583926.pdf Final Published version, 2.27 MB, PDF Publisher's Copyright Statement This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in S. Nayak, Ho Tin Ng, and A. Pramanick , "Enhanced dielectric permittivity and relaxor behavior in thermally annealed P(VDF-TrFE) copolymer films", Appl. Phys. Lett. 117, 232903 (2020) and may be found at https://doi.org/10.1063/5.0010569.
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(bed2ba6c-5a79-477c-9438-c1b5147ea7cd).html

Abstract

Modification of relaxor behavior and large enhancement in dielectric permittivity are demonstrated in a P(VDF-TrFE) ferroelectric polymer film by thermal annealing treatment. For coexisting normal ferroelectric and relaxor behavior in P(VDF-TrFE) (molar ratio: 45:55) films, the relative contribution from the relaxor component is increased when annealed at high temperature and subsequently quenched. A relative peak permittivity of ε′ ∼ 100 is obtained for an annealing temperature of T = 90 ºC, which is one of the highest reported so far among poly(vinylidene fluoride) copolymer and terpolymer films. Based on x-ray diffraction analysis, we attribute the changes in dielectric properties to a decrease in crystallite domain size and a consequent increase in the crystalline-amorphous interfacial area.