Energy distribution and depth profile of BF3 plasma doping into silicon

Dixon T. K. Kwok; Paul K. Chu; M. Takase; B. Mizuno

Energy distribution and depth profile of BF₃ plasma doping into silicon

Dixon T. K. Kwok, Paul K. Chu, M. Takase, B. Mizuno

Research output: Conference Papers › RGC 31B - Invited conference paper (non-refereed items) › Yes

Original language	English
Publication status	Published - Dec 1999
Event	5th International Workshop on Plasma-Based Ion Implantation (PBII-99) - Kyoto, Japan Duration: 13 Dec 1999 → 16 Dec 1999

Workshop

Workshop	5th International Workshop on Plasma-Based Ion Implantation (PBII-99)
Place	Japan
City	Kyoto
Period	13/12/99 → 16/12/99

Bibliographical note

Information for this record is supplemented by the author(s) concerned.

Other Access Options

Check CityUHK Library

Permanent Link

Right click to copy link

Cite this

@conference{960e57c5ec35434183b789df28c9858c,

title = "Energy distribution and depth profile of BF3 plasma doping into silicon",

author = "Kwok, {Dixon T. K.} and Chu, {Paul K.} and M. Takase and B. Mizuno",

note = "Information for this record is supplemented by the author(s) concerned.; 5th International Workshop on Plasma-Based Ion Implantation (PBII-99)<br/> ; Conference date: 13-12-1999 Through 16-12-1999",

year = "1999",

month = dec,

language = "English",

}

TY - CONF

T1 - Energy distribution and depth profile of BF3 plasma doping into silicon

AU - Kwok, Dixon T. K.

AU - Chu, Paul K.

AU - Takase, M.

AU - Mizuno, B.

N1 - Information for this record is supplemented by the author(s) concerned.

PY - 1999/12

Y1 - 1999/12

M3 - RGC 31B - Invited conference paper (non-refereed items)

T2 - 5th International Workshop on Plasma-Based Ion Implantation (PBII-99)<br/>

Y2 - 13 December 1999 through 16 December 1999

ER -