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Electronic structure of MoO3−x/graphene interface

Qi-Hui Wu, Yingqi Zhao, Guo Hong, Jian-Guo Ren, Chundong Wang, Wenjun Zhang, Shuit-Tong Lee*

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

The interfacial electronic structure of MoO3-x/graphene has been investigated using photoemission spectroscopy. The experimental data showed that upon deposition of MoO3-x, the Fermi level of graphene shifts downward gradually from its Dirac point due to the p-type doping effect. From the Fermi level shift of -0.28 eV, the hole density of graphene was estimated to be 5.44 × 1012 cm-2. The formation of surface negative dipole due to electron transfer from graphene to the deposited MoO3-x films increased the sample′s work function. The existence of gap states in MoO3-x induced by oxygen vacancies greatly reduced the hole injection barrier at the MoO3-x/graphene interface. © 2013 Elsevier Ltd.
Original languageEnglish
Pages (from-to)46-52
JournalCarbon
Volume65
Online published2 Aug 2013
DOIs
Publication statusPublished - Dec 2013

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