@inproceedings{70e51e42df5e4d4ebd7aa014150bfc8b,
title = "Electron-beam direct-write polymeric optical waveguides",
abstract = "Polymeric single mode optical waveguides based on a new kind of negative tone epoxy novolak resin (ENR) polymer have been fabricated using electron beam direct writing. This polymer has a high refractive index, high sensitivity and high glass transition temperature (Tg). Contrast curves and saturation dosages of the polymer on different substrate materials were obtained, and the sensitivity of ENR is found to be over a hundred times larger than that of Polymethyl-methacrylate (PMMA). For single mode channel waveguides with upper claddings, the propagation losses measured were 0.22 dB/cm and 0.48dB/cm at 1330 nm and 1550 nm for TM mode, and 0.9 dB/cm and 1.2 dB/cm for TE mode, respectively.",
keywords = "Electron beam lithography, Optical waveguide, Polymer",
author = "Wong, \{Wing Han\} and Pun, \{Edwin Y. B.\}",
note = "Research Unit(s) information for this publication is provided by the author(s) concerned.; 2001 International Symposium on Optical Science and Technology ; Conference date: 29-07-2001 Through 03-08-2001",
year = "2001",
doi = "10.1117/12.447639",
language = "English",
isbn = "0819441678",
series = "Proceedings of SPIE",
publisher = "SPIE",
pages = "100--105",
editor = "Armenise, \{Mario Nicola\}",
booktitle = "Materials and Devices for Photonic Circuits II",
address = "United States",
}