Electron beam direct write polymeric optical waveguides

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journalNot applicable

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Detail(s)

Original languageEnglish
Pages (from-to)100-105
Journal / PublicationProceedings of SPIE - The International Society for Optical Engineering
Volume4453
Publication statusPublished - 2001

Conference

TitleMaterials and Devices for Photonic Circuits II
PlaceUnited States
CitySan Diego, CA
Period1 - 2 August 2001

Abstract

Polymeric single mode optical waveguides based on a new kind of negative tone epoxy novolak resin (ENR) polymer have been fabricated using electron beam direct writing. This polymer has a high refractive index, high sensitivity and high glass transition temperature (Tg). Contrast curves and saturation dosages of the polymer on different substrate materials were obtained, and the sensitivity of ENR is found to be over a hundred times larger than that of Polymethyl-methacrylate (PMMA). For single mode channel waveguides with upper claddings, the propagation losses measured were 0.22dB/cm and 0.48dB/cm at 1330nm and 1550nm for TM mode, and 0.9dB/cm and 1.2dB/cm for TE mode, respectively.

Research Area(s)

  • Electron beam lithography, Optical waveguide, Polymer