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Electron Barrier Engineering in a Thin-Film Intermediate-Band Solar Cell

  • Nazmul Ahsan
  • , Naoya Miyashita
  • , Kin Man Yu
  • , Wladek Walukiewicz
  • , Yoshitaka Okada

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Improved open-circuit voltages have been achieved in dilute nitride thin-film intermediate-band solar cells by optimizing intermediate-band barrier layers. The blocking properties of the AlGaAs electron barrier are found to critically depend on the barrier-doping level. Open-circuit voltages VOC improved when electron-doping levels in the AlGaAs barriers were reduced. This is ascribed to the increased association of VOC with the larger gap defined by the valence and conduction bands due to the improved electrical isolation of the intermediate band.
Original languageEnglish
Article number7076589
Pages (from-to)878-884
JournalIEEE Journal of Photovoltaics
Volume5
Issue number3
Online published1 Apr 2015
DOIs
Publication statusPublished - May 2015
Externally publishedYes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Research Keywords

  • Dilute nitride
  • intermediate-band (IB) solar cell
  • molecular beam epitaxy (MBE)
  • thin-film solar cell

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