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Electrodeposition of nanostructured MnO2 electrode on three-dimensional nickel/silicon microchannel plates for miniature supercapacitors

Yuwei Xu, Shaohui Xu*, Mai Li, Yiping Zhu, Lianwei Wang*, Paul K. Chu

*Corresponding author for this work

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Abstract

    Manganese-dioxide is electrodeposited on three-dimensional nickel/silicon microchannel plates (Si-MCPs) to produce miniature supercapacitors. The nanostructured MnO2 thin film can be clearly observed from the channels and largely contribute to the capacitance. The compositions and morphology are characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The electrochemical properties are investigated by cyclic voltammetry (CV), galvanostatic charging-discharging, and electrochemical impedance spectroscopy (EIS) in a neutral 1 M Na2SO4 solution which preserves the structure of the substrate. The capacitance is 0.961 F/cm2 or 323.1 F/g and the retention ratio is 91.1% after 1000 cycles thereby demonstrating the robustness and durability. © 2014 Elsevier B.V.
    Original languageEnglish
    Pages (from-to)116-118
    JournalMaterials Letters
    Volume126
    Online published13 Apr 2014
    DOIs
    Publication statusPublished - 1 Jul 2014

    Research Keywords

    • Deposition
    • Silicon microchannel plates (Si-MCPs)
    • Supercapacitor
    • Thin films
    • Manganese dioxide (MnO2)

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