Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Shixin Wu
  • Zongyou Yin
  • Gang Lu
  • Xiaozhu Zhou

Detail(s)

Original languageEnglish
Pages (from-to)3467-3470
Journal / PublicationJournal of Materials Chemistry
Volume21
Issue number10
Online published15 Dec 2010
Publication statusPublished - 14 Mar 2011
Externally publishedYes

Abstract

Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu2O (Cl-Cu2O) on rGO electrodes. The structure and properties of the deposited Cl-Cu2O have been investigated extensively. Moreover, the effect of Cl doping on the carrier concentration and photocurrent of Cl-Cu 2O has also been investigated. Our study shows significant implications in tailoring the properties of materials deposited on rGO electrodes by using electrochemical methods. © 2011 The Royal Society of Chemistry.

Citation Format(s)

Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes. / Wu, Shixin; Yin, Zongyou; He, Qiyuan; Lu, Gang; Zhou, Xiaozhu; Zhang, Hua.

In: Journal of Materials Chemistry, Vol. 21, No. 10, 14.03.2011, p. 3467-3470.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review