Electrochemical analysis of interface adsorption phenomena on three-dimensional nano-nickel electrode deposited on silicon microchannel plate

Shaohui Xu; Yiping Zhu; Dayuan Xiong; Lianwei Wang; Pingxiong Yang; Paul K. Chu

doi:10.1016/j.electacta.2016.02.131

Author(s)

Shaohui Xu
Yiping Zhu
Dayuan Xiong
Lianwei Wang
Pingxiong Yang

Detail(s)

Original language	English
Pages (from-to)	253-262
Journal / Publication	Electrochimica Acta
Volume	194
Online published	23 Feb 2016
Publication status	Published - 10 Mar 2016

Link(s)

DOI	DOI https://doi.org/10.1016/j.electacta.2016.02.131 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-84958974780&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(49f91857-7372-47a9-a4a5-018958d19111).html

Abstract

The electrochemical double-layer capacitance and adsorption-desorption phenomena of the three-dimensional (3D) nano-nickel electrode on silicon microchannel plate is investigated electrochemically in the neutral aqueous solution. The electrochemical double-layer capacitance of the 3D electrode increases due to the porous structure of the nickel electrode and 3D architecture of the silicon microchannel plate and the charging process can be completed in a shorter time due to the special 3D architecture. The specific monolayer adsorption, electrochemical double-layer adsorption, and diffusion-limited electrochemical processes can be identified clearly on account of the larger surface area and described by an exponential relationship. Different adsorption quantities are also observed from cations and anions on account of the small channels in the 3D nano-nickel electrode.

Research Area(s)

Electrochemical analysis, interface adsorption phenomena, Three-dimensional nano-nickel electrode

Citation Format(s)

[ RIS ] [ BibTeX ]

Electrochemical analysis of interface adsorption phenomena on three-dimensional nano-nickel electrode deposited on silicon microchannel plate. / Xu, Shaohui; Zhu, Yiping; Xiong, Dayuan et al.
In: Electrochimica Acta, Vol. 194, 10.03.2016, p. 253-262.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Xu, S, Zhu, Y, Xiong, D, Wang, L, Yang, P & Chu, PK 2016, 'Electrochemical analysis of interface adsorption phenomena on three-dimensional nano-nickel electrode deposited on silicon microchannel plate', Electrochimica Acta, vol. 194, pp. 253-262. https://doi.org/10.1016/j.electacta.2016.02.131

Xu, S., Zhu, Y., Xiong, D., Wang, L., Yang, P., & Chu, P. K. (2016). Electrochemical analysis of interface adsorption phenomena on three-dimensional nano-nickel electrode deposited on silicon microchannel plate. Electrochimica Acta, 194, 253-262. https://doi.org/10.1016/j.electacta.2016.02.131

Xu S, Zhu Y, Xiong D, Wang L, Yang P, Chu PK. Electrochemical analysis of interface adsorption phenomena on three-dimensional nano-nickel electrode deposited on silicon microchannel plate. Electrochimica Acta. 2016 Mar 10;194:253-262. Epub 2016 Feb 23. doi: 10.1016/j.electacta.2016.02.131

Xu, Shaohui ; Zhu, Yiping ; Xiong, Dayuan et al. / Electrochemical analysis of interface adsorption phenomena on three-dimensional nano-nickel electrode deposited on silicon microchannel plate. In: Electrochimica Acta. 2016 ; Vol. 194. pp. 253-262.