TY - JOUR
T1 - Electrically controlled band gap and topological phase transition in two-dimensional multilayer germanane
AU - Qi, Jingshan
AU - Li, Xiao
AU - Qian, Xiaofeng
PY - 2016/6
Y1 - 2016/6
N2 - Electrically controlled band gap and topological electronic states are important for the next-generation topological quantum devices. In this letter, we study the electric field control of band gap and topological phase transitions in multilayer germanane. We find that although the monolayer and multilayer germananes are normal insulators, a vertical electric field can significantly reduce the band gap of multilayer germananes owing to the giant Stark effect. The decrease of band gap eventually leads to band inversion, transforming them into topological insulators with nontrivial Z2 invariant. The electrically controlled topological phase transition in multilayer germananes provides a potential route to manipulate topologically protected edge states and design topological quantum devices. This strategy should be generally applicable to a broad range of materials, including other two-dimensional materials and ultrathin films with controlled growth. Published by AIP Publishing.
AB - Electrically controlled band gap and topological electronic states are important for the next-generation topological quantum devices. In this letter, we study the electric field control of band gap and topological phase transitions in multilayer germanane. We find that although the monolayer and multilayer germananes are normal insulators, a vertical electric field can significantly reduce the band gap of multilayer germananes owing to the giant Stark effect. The decrease of band gap eventually leads to band inversion, transforming them into topological insulators with nontrivial Z2 invariant. The electrically controlled topological phase transition in multilayer germananes provides a potential route to manipulate topologically protected edge states and design topological quantum devices. This strategy should be generally applicable to a broad range of materials, including other two-dimensional materials and ultrathin films with controlled growth. Published by AIP Publishing.
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U2 - 10.1063/1.4954645
DO - 10.1063/1.4954645
M3 - RGC 21 - Publication in refereed journal
SN - 0003-6951
VL - 108
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 25
M1 - 253107
ER -