Electrical design for manufacturability and lithography and stress variability hotspot detection flows at 28nmn

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with ISBN/ISSN)peer-review

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Author(s)

Detail(s)

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume8327
ISBN (Print)9780819489838
Publication statusPublished - 2012
Externally publishedYes

Publication series

Name
Volume8327
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Title2012 SPIE Conference on Design for Manufacturability through Design-Process Integration, DfM-DPI 2012
PlaceUnited States
CitySan Jose, CA
Period15 - 16 February 2012

Abstract

Lithography and stress effects cause Layout Dependent Variability (LDV), which results in unexpected and unaccounted timing variations. Because standard cells yield unpredicted timing variation due to context differences, the LDV methodology includes the Cell Context Analysis (CCA) flow that provides designers a comprehensive framework to optimize the design layouts and tune the cell's electrical performance. Conventional static timing analysis tools do not incorporate the electrical impact due to nearby context proximity. The LDV methodology includes an Advanced Timing Analysis (ATA) flow that accounts for the electrical impact of cell contexts, which provides more accurate timing results and identifies new timing violations on critical paths. This paper presents the electrical DFM (eDFM) methodologies developed by GLOBALFOUNDRIES using Cadence LEA (Litho Electrical Analyzer) at 28nm technology node. The paper also discusses about the CCA results for more than 40 contexts of each cell and reports mean delay variations of 3% or more. © 2012 Copyright SPIE.

Citation Format(s)

Electrical design for manufacturability and lithography and stress variability hotspot detection flows at 28nmn. / Hurat, Philippe; Zhu, Jianhao; Teoh, Edward.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8327 SPIE, 2012. 832715.

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with ISBN/ISSN)peer-review