Effects of stirring on the bulk etch rate of LR 115 detector

C. W Y Yip; J. P Y Ho; V. S Y Koo; D. Nikezic; K. N. Yu

doi:10.1016/S1350-4487(03)00045-3

Effects of stirring on the bulk etch rate of LR 115 detector

C. W Y Yip, J. P Y Ho, V. S Y Koo, D. Nikezic, K. N. Yu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

39 Citations (Scopus)

Abstract

The effects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface profile measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60°C. The bulk etch rate under magnetic stirring has been found to be 6.65 ± 0.34 μm h^-1 and that under no stirring to be 3.61 ± 0.14 μm h^-1. The initial thickness of the active layer before etching also varies. © 2003 Elsevier Science Ltd. All rights reserved.

Original language	English
Pages (from-to)	197-200
Journal	Radiation Measurements
Volume	37
Issue number	3
DOIs	https://doi.org/10.1016/S1350-4487(03)00045-3
Publication status	Published - Jun 2003

Research Keywords

Bulk etch rate
LR 115
Natural radioactivity
Radon
Solid state nuclear track detector
SSNTD

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title = "Effects of stirring on the bulk etch rate of LR 115 detector",

abstract = "The effects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface profile measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60°C. The bulk etch rate under magnetic stirring has been found to be 6.65 ± 0.34 μm h-1 and that under no stirring to be 3.61 ± 0.14 μm h-1. The initial thickness of the active layer before etching also varies. {\textcopyright} 2003 Elsevier Science Ltd. All rights reserved.",

keywords = "Bulk etch rate, LR 115, Natural radioactivity, Radon, Solid state nuclear track detector, SSNTD",

author = "Yip, {C. W Y} and Ho, {J. P Y} and Koo, {V. S Y} and D. Nikezic and Yu, {K. N.}",

year = "2003",

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T1 - Effects of stirring on the bulk etch rate of LR 115 detector

AU - Yip, C. W Y

AU - Ho, J. P Y

AU - Koo, V. S Y

AU - Nikezic, D.

AU - Yu, K. N.

PY - 2003/6

Y1 - 2003/6

N2 - The effects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface profile measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60°C. The bulk etch rate under magnetic stirring has been found to be 6.65 ± 0.34 μm h-1 and that under no stirring to be 3.61 ± 0.14 μm h-1. The initial thickness of the active layer before etching also varies. © 2003 Elsevier Science Ltd. All rights reserved.

AB - The effects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface profile measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60°C. The bulk etch rate under magnetic stirring has been found to be 6.65 ± 0.34 μm h-1 and that under no stirring to be 3.61 ± 0.14 μm h-1. The initial thickness of the active layer before etching also varies. © 2003 Elsevier Science Ltd. All rights reserved.

KW - Bulk etch rate

KW - LR 115

KW - Natural radioactivity

KW - Radon

KW - Solid state nuclear track detector

KW - SSNTD

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U2 - 10.1016/S1350-4487(03)00045-3

DO - 10.1016/S1350-4487(03)00045-3

M3 - RGC 21 - Publication in refereed journal

SN - 1350-4487

VL - 37

SP - 197

EP - 200

JO - Radiation Measurements

JF - Radiation Measurements

IS - 3

ER -

Effects of stirring on the bulk etch rate of LR 115 detector

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