Effects of stirring on the bulk etch rate of LR 115 detector
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 197-200 |
Journal / Publication | Radiation Measurements |
Volume | 37 |
Issue number | 3 |
Publication status | Published - Jun 2003 |
Link(s)
Abstract
The effects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface profile measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60°C. The bulk etch rate under magnetic stirring has been found to be 6.65 ± 0.34 μm h-1 and that under no stirring to be 3.61 ± 0.14 μm h-1. The initial thickness of the active layer before etching also varies. © 2003 Elsevier Science Ltd. All rights reserved.
Research Area(s)
- Bulk etch rate, LR 115, Natural radioactivity, Radon, Solid state nuclear track detector, SSNTD
Citation Format(s)
Effects of stirring on the bulk etch rate of LR 115 detector. / Yip, C. W Y; Ho, J. P Y; Koo, V. S Y et al.
In: Radiation Measurements, Vol. 37, No. 3, 06.2003, p. 197-200.
In: Radiation Measurements, Vol. 37, No. 3, 06.2003, p. 197-200.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review