Effects of plasma hydrogenation on low temperature growth of nanocrystalline cubic SiC thin films

M. Wang; A. P. Huang; Paul K. Chu; B. Wang; H. Yan

doi:10.1016/j.diamond.2006.11.002

Effects of plasma hydrogenation on low temperature growth of nanocrystalline cubic SiC thin films

M. Wang, A. P. Huang, Paul K. Chu, B. Wang, H. Yan

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

5 Citations (Scopus)

Abstract

The effects of plasma hydrogenation on the fabrication of nanocrystalline cubic silicon carbide (SiC) thin films on Si (100) are investigated. Our results indicate that plasma hydrogenation is an effective method to reduce the deposition temperature and to improve the composition and microstructure of the cubic SiC (β-SiC) thin films. In particular, the crystal particle size and the oxygen diffusion can be controlled. The mechanism is discussed. © 2006 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	826-830
Journal	Diamond and Related Materials
Volume	16
Issue number	4-7 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.diamond.2006.11.002
Publication status	Published - Apr 2007

Research Keywords

Film
PECVD
Plasma hydrogenation
SiC

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title = "Effects of plasma hydrogenation on low temperature growth of nanocrystalline cubic SiC thin films",

abstract = "The effects of plasma hydrogenation on the fabrication of nanocrystalline cubic silicon carbide (SiC) thin films on Si (100) are investigated. Our results indicate that plasma hydrogenation is an effective method to reduce the deposition temperature and to improve the composition and microstructure of the cubic SiC (β-SiC) thin films. In particular, the crystal particle size and the oxygen diffusion can be controlled. The mechanism is discussed. {\textcopyright} 2006 Elsevier B.V. All rights reserved.",

keywords = "Film, PECVD, Plasma hydrogenation, SiC",

author = "M. Wang and Huang, {A. P.} and Chu, {Paul K.} and B. Wang and H. Yan",

year = "2007",

month = apr,

doi = "10.1016/j.diamond.2006.11.002",

language = "English",

volume = "16",

pages = "826--830",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier B.V.",

number = "4-7 SPEC. ISS.",

}

TY - JOUR

T1 - Effects of plasma hydrogenation on low temperature growth of nanocrystalline cubic SiC thin films

AU - Wang, M.

AU - Huang, A. P.

AU - Chu, Paul K.

AU - Wang, B.

AU - Yan, H.

PY - 2007/4

Y1 - 2007/4

N2 - The effects of plasma hydrogenation on the fabrication of nanocrystalline cubic silicon carbide (SiC) thin films on Si (100) are investigated. Our results indicate that plasma hydrogenation is an effective method to reduce the deposition temperature and to improve the composition and microstructure of the cubic SiC (β-SiC) thin films. In particular, the crystal particle size and the oxygen diffusion can be controlled. The mechanism is discussed. © 2006 Elsevier B.V. All rights reserved.

AB - The effects of plasma hydrogenation on the fabrication of nanocrystalline cubic silicon carbide (SiC) thin films on Si (100) are investigated. Our results indicate that plasma hydrogenation is an effective method to reduce the deposition temperature and to improve the composition and microstructure of the cubic SiC (β-SiC) thin films. In particular, the crystal particle size and the oxygen diffusion can be controlled. The mechanism is discussed. © 2006 Elsevier B.V. All rights reserved.

KW - Film

KW - PECVD

KW - Plasma hydrogenation

KW - SiC

UR - http://www.scopus.com/inward/record.url?scp=34047266015&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-34047266015&origin=recordpage

U2 - 10.1016/j.diamond.2006.11.002

DO - 10.1016/j.diamond.2006.11.002

M3 - RGC 21 - Publication in refereed journal

SN - 0925-9635

VL - 16

SP - 826

EP - 830

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 4-7 SPEC. ISS.

ER -

Effects of plasma hydrogenation on low temperature growth of nanocrystalline cubic SiC thin films

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Research Keywords

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