Effects of O 2 /Ar flow ratio on the alcohol sensitivity of tin oxide film

Hsiao-Ching Lee; Weng-Sing Hwang; Gwo-Bin Lee; Yang-Ming Lu

doi:10.1016/j.apsusc.2005.05.022

Effects of O ₂ /Ar flow ratio on the alcohol sensitivity of tin oxide film

Hsiao-Ching Lee^*, Weng-Sing Hwang, Gwo-Bin Lee, Yang-Ming Lu

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

10 Citations (Scopus)

Abstract

The aim of this study is to find the effects of oxygen flow rate during manufacturing on the sensitivity of SnO ₂ (tin oxide) thin films to ethanol (C ₂ H ₅ OH). In this study, an RF sputtering process was employed to fabricate the SnO ₂ thin films. The SnO ₂ was deposited on gold electrode silicon microchips. A target composed of SnO ₂ doped with 1 at.% Li was used with a working pressure of 3 mTorr. The RF power was fixed at 150 W. The reaction gas was a mixture of argon and oxygen. The total flow rate was constant at 50 sccm with the O ₂ /Ar ratio varying from 0.2 to 0.8. An annealing heat treatment was employed at 400 °C for 1 h to stabilize the properties of the films. The sensitivity of the film to ethanol was tested by placing the micro-reactor device on a hot plate, heated to 300 °C, and measuring the variation of electrical resistivity of the film with and without the presence of ethanol. The results show that an O ₂ /Ar flow ratio of 0.2 produces films with the highest ethanol sensitivity. Before heat treating, the ethanol sensitivity was 126. After heat treating at 400 °C for 1 h, the sensitivity decreased to 104. © 2005 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	3502-3508
Journal	Applied Surface Science
Volume	252
Issue number	10
DOIs	https://doi.org/10.1016/j.apsusc.2005.05.022
Publication status	Published - 15 Mar 2006
Externally published	Yes

Bibliographical note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Research Keywords

Ethanol
Gas sensor
Sensitivity
Tin oxide

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Cite this

@article{39a46c5d9742472eb40012decde8ccee,

title = "Effects of O 2 /Ar flow ratio on the alcohol sensitivity of tin oxide film",

abstract = "The aim of this study is to find the effects of oxygen flow rate during manufacturing on the sensitivity of SnO 2 (tin oxide) thin films to ethanol (C 2 H 5 OH). In this study, an RF sputtering process was employed to fabricate the SnO 2 thin films. The SnO 2 was deposited on gold electrode silicon microchips. A target composed of SnO 2 doped with 1 at.% Li was used with a working pressure of 3 mTorr. The RF power was fixed at 150 W. The reaction gas was a mixture of argon and oxygen. The total flow rate was constant at 50 sccm with the O 2 /Ar ratio varying from 0.2 to 0.8. An annealing heat treatment was employed at 400 °C for 1 h to stabilize the properties of the films. The sensitivity of the film to ethanol was tested by placing the micro-reactor device on a hot plate, heated to 300 °C, and measuring the variation of electrical resistivity of the film with and without the presence of ethanol. The results show that an O 2 /Ar flow ratio of 0.2 produces films with the highest ethanol sensitivity. Before heat treating, the ethanol sensitivity was 126. After heat treating at 400 °C for 1 h, the sensitivity decreased to 104. {\textcopyright} 2005 Elsevier B.V. All rights reserved.",

keywords = "Ethanol, Gas sensor, Sensitivity, Tin oxide",

author = "Hsiao-Ching Lee and Weng-Sing Hwang and Gwo-Bin Lee and Yang-Ming Lu",

note = "Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].",

year = "2006",

month = mar,

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doi = "10.1016/j.apsusc.2005.05.022",

language = "English",

volume = "252",

pages = "3502--3508",

journal = "Applied Surface Science",

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TY - JOUR

T1 - Effects of O 2 /Ar flow ratio on the alcohol sensitivity of tin oxide film

AU - Lee, Hsiao-Ching

AU - Hwang, Weng-Sing

AU - Lee, Gwo-Bin

AU - Lu, Yang-Ming

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2006/3/15

Y1 - 2006/3/15

N2 - The aim of this study is to find the effects of oxygen flow rate during manufacturing on the sensitivity of SnO 2 (tin oxide) thin films to ethanol (C 2 H 5 OH). In this study, an RF sputtering process was employed to fabricate the SnO 2 thin films. The SnO 2 was deposited on gold electrode silicon microchips. A target composed of SnO 2 doped with 1 at.% Li was used with a working pressure of 3 mTorr. The RF power was fixed at 150 W. The reaction gas was a mixture of argon and oxygen. The total flow rate was constant at 50 sccm with the O 2 /Ar ratio varying from 0.2 to 0.8. An annealing heat treatment was employed at 400 °C for 1 h to stabilize the properties of the films. The sensitivity of the film to ethanol was tested by placing the micro-reactor device on a hot plate, heated to 300 °C, and measuring the variation of electrical resistivity of the film with and without the presence of ethanol. The results show that an O 2 /Ar flow ratio of 0.2 produces films with the highest ethanol sensitivity. Before heat treating, the ethanol sensitivity was 126. After heat treating at 400 °C for 1 h, the sensitivity decreased to 104. © 2005 Elsevier B.V. All rights reserved.

AB - The aim of this study is to find the effects of oxygen flow rate during manufacturing on the sensitivity of SnO 2 (tin oxide) thin films to ethanol (C 2 H 5 OH). In this study, an RF sputtering process was employed to fabricate the SnO 2 thin films. The SnO 2 was deposited on gold electrode silicon microchips. A target composed of SnO 2 doped with 1 at.% Li was used with a working pressure of 3 mTorr. The RF power was fixed at 150 W. The reaction gas was a mixture of argon and oxygen. The total flow rate was constant at 50 sccm with the O 2 /Ar ratio varying from 0.2 to 0.8. An annealing heat treatment was employed at 400 °C for 1 h to stabilize the properties of the films. The sensitivity of the film to ethanol was tested by placing the micro-reactor device on a hot plate, heated to 300 °C, and measuring the variation of electrical resistivity of the film with and without the presence of ethanol. The results show that an O 2 /Ar flow ratio of 0.2 produces films with the highest ethanol sensitivity. Before heat treating, the ethanol sensitivity was 126. After heat treating at 400 °C for 1 h, the sensitivity decreased to 104. © 2005 Elsevier B.V. All rights reserved.

KW - Ethanol

KW - Gas sensor

KW - Sensitivity

KW - Tin oxide

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DO - 10.1016/j.apsusc.2005.05.022

M3 - RGC 21 - Publication in refereed journal

SN - 0169-4332

VL - 252

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JO - Applied Surface Science

JF - Applied Surface Science

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