Effects of nitrogen ion implantation and implantation energy on surface properties and adhesion strength of TiN films deposited on aluminum by magnetron sputtering

Youming Liu, Liuhe Li, Ming Xu, Xun Cai, Qiulong Chen, Yawei Hu, Paul K. Chu

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    15 Citations (Scopus)

    Abstract

    The performance of tribological coatings depends greatly on the adhesion strength between the coatings and substrates. In this work, we investigated the influence of the ion implantation energy of nitrogen on the adhesion and surface properties of TiN deposited on aluminum substrate. Aluminum samples were implanted with 15 keV, 30 keV and 40 keV nitrogen ions before TiN films were deposited using magnetron sputtering in a custom-designed multi-functional ion implanter. The adhesion properties of the implanted TiN films were assessed using nano-scratch tests and were observed to vary with the nitrogen ion implantation energy. Our frictional test results show that an appropriate ion implantation energy and dose can improve the frictional behavior of TiN films deposited on aluminum. © 2005 Elsevier B.V. All rights reserved.
    Original languageEnglish
    Pages (from-to)140-144
    JournalMaterials Science and Engineering A
    Volume415
    Issue number1-2
    DOIs
    Publication statusPublished - 15 Jan 2006

    Research Keywords

    • Adhesion strength
    • Frictional behavior
    • Nitrogen ion implantation
    • TiN films

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