Effects of electron concentration on the optical absorption edge of InN
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 2805-2807 |
Journal / Publication | Applied Physics Letters |
Volume | 84 |
Issue number | 15 |
Publication status | Published - 12 Apr 2004 |
Externally published | Yes |
Link(s)
Abstract
The effects of free electron concentration were analyzed which ranged form 10 17 to 10 20 cm -3. The optical absorption, Hall effect and ion mass spectrometry were used for performing the investigation. The intrinsic band gap of InN of about 0.7 to 1.7 eV was observed for optical absorption edge. The Burstein-Moss shift was used to account electron concentration dependence of optical absorption edge energy. The O and H impurities were not able to fully account for free electron concentration in films which was shown by secondary ion mass spectrometry.
Citation Format(s)
Effects of electron concentration on the optical absorption edge of InN. / Wu, J.; Walukiewicz, W.; Li, S. X. et al.
In: Applied Physics Letters, Vol. 84, No. 15, 12.04.2004, p. 2805-2807.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review