Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

Deli Tang; Paul K. Chu

doi:10.1063/1.1568151

Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

Deli Tang, Paul K. Chu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

15 Citations (Scopus)

Abstract

Effects of assistant anode on planar inductively coupled magnetized argon plasma were investigated. The effect of assistant anode and magnetic field on the efficiency of radio frequency (RF) power absorption and plasma parameters was also investigated. The analysis showed that the RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge.

Original language	English
Pages (from-to)	5883-5887
Journal	Journal of Applied Physics
Volume	93
Issue number	10 1
DOIs	https://doi.org/10.1063/1.1568151
Publication status	Published - 15 May 2003

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title = "Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation",

abstract = "Effects of assistant anode on planar inductively coupled magnetized argon plasma were investigated. The effect of assistant anode and magnetic field on the efficiency of radio frequency (RF) power absorption and plasma parameters was also investigated. The analysis showed that the RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge.",

author = "Deli Tang and Chu, {Paul K.}",

year = "2003",

month = may,

day = "15",

doi = "10.1063/1.1568151",

language = "English",

volume = "93",

pages = "5883--5887",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "10 1",

}

TY - JOUR

T1 - Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

AU - Tang, Deli

AU - Chu, Paul K.

PY - 2003/5/15

Y1 - 2003/5/15

N2 - Effects of assistant anode on planar inductively coupled magnetized argon plasma were investigated. The effect of assistant anode and magnetic field on the efficiency of radio frequency (RF) power absorption and plasma parameters was also investigated. The analysis showed that the RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge.

AB - Effects of assistant anode on planar inductively coupled magnetized argon plasma were investigated. The effect of assistant anode and magnetic field on the efficiency of radio frequency (RF) power absorption and plasma parameters was also investigated. The analysis showed that the RF power absorption by the plasma can be effectively enhanced by the external magnetic field compared with the nonmagnetized discharge.

UR - http://www.scopus.com/inward/record.url?scp=0037974747&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0037974747&origin=recordpage

U2 - 10.1063/1.1568151

DO - 10.1063/1.1568151

M3 - RGC 21 - Publication in refereed journal

SN - 0021-8979

VL - 93

SP - 5883

EP - 5887

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10 1

ER -

Effects of assistant anode on planar inductively coupled magnetized argon plasma in plasma immersion ion implantation

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