Effects of annealing on mechanical behavior of Zr–Ti–Ni thin film metallic glasses

Chu-Shuan Chen; Pakman Yiu; Chia-Lin Li; Jinn P. Chu; Chan-Hung Shek; Chun-Hway Hsueh

doi:10.1016/j.msea.2014.03.144

Effects of annealing on mechanical behavior of Zr–Ti–Ni thin film metallic glasses

Chu-Shuan Chen, Pakman Yiu, Chia-Lin Li, Jinn P. Chu, Chan-Hung Shek, Chun-Hway Hsueh^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

43 Citations (Scopus)

Abstract

Zr₄₆Ti₂₆Ni₂₈ thin film metallic glass was fabricated by radio frequency magnetron single target sputtering on Si and stainless steel substrates. The as-deposited film was found to be fully amorphous with high glass transition and crystallization temperatures of 466 °C and 502 °C, respectively. Its hardness progressively increased from 6.2 GPa to as high as 11.1 GPa when subjected to annealing near the glass-transition temperature at 450 °C. It was also of good adhesive strength and scratch resistance after the annealing treatment at 400 °C. Transmission electron microscopy results revealed annealing-induced nanocrystals that accounted for such superior mechanical properties. With the above unique properties, Zr-Ti-Ni thin film metallic glass has the potential for the fabrication of high strength micro parts and protective coating. © 2014 Elsevier B.V.

Original language	English
Pages (from-to)	258-264
Journal	Materials Science & Engineering A
Volume	608
Online published	2 May 2014
DOIs	https://doi.org/10.1016/j.msea.2014.03.144
Publication status	Published - 1 Jul 2014

Research Keywords

Amorphous alloys
Annealing
Hardness measurement
Mechanical characterization
Nanoindentation
Shear bands

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10.1016/j.msea.2014.03.144

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title = "Effects of annealing on mechanical behavior of Zr–Ti–Ni thin film metallic glasses",

abstract = "Zr46Ti26Ni28 thin film metallic glass was fabricated by radio frequency magnetron single target sputtering on Si and stainless steel substrates. The as-deposited film was found to be fully amorphous with high glass transition and crystallization temperatures of 466 °C and 502 °C, respectively. Its hardness progressively increased from 6.2 GPa to as high as 11.1 GPa when subjected to annealing near the glass-transition temperature at 450 °C. It was also of good adhesive strength and scratch resistance after the annealing treatment at 400 °C. Transmission electron microscopy results revealed annealing-induced nanocrystals that accounted for such superior mechanical properties. With the above unique properties, Zr-Ti-Ni thin film metallic glass has the potential for the fabrication of high strength micro parts and protective coating. {\textcopyright} 2014 Elsevier B.V.",

keywords = "Amorphous alloys, Annealing, Hardness measurement, Mechanical characterization, Nanoindentation, Shear bands",

author = "Chu-Shuan Chen and Pakman Yiu and Chia-Lin Li and Chu, {Jinn P.} and Chan-Hung Shek and Chun-Hway Hsueh",

year = "2014",

month = jul,

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doi = "10.1016/j.msea.2014.03.144",

language = "English",

volume = "608",

pages = "258--264",

journal = "Materials Science & Engineering A",

issn = "0921-5093",

publisher = "Elsevier Ltd.",

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TY - JOUR

T1 - Effects of annealing on mechanical behavior of Zr–Ti–Ni thin film metallic glasses

AU - Chen, Chu-Shuan

AU - Yiu, Pakman

AU - Li, Chia-Lin

AU - Chu, Jinn P.

AU - Shek, Chan-Hung

AU - Hsueh, Chun-Hway

PY - 2014/7/1

Y1 - 2014/7/1

N2 - Zr46Ti26Ni28 thin film metallic glass was fabricated by radio frequency magnetron single target sputtering on Si and stainless steel substrates. The as-deposited film was found to be fully amorphous with high glass transition and crystallization temperatures of 466 °C and 502 °C, respectively. Its hardness progressively increased from 6.2 GPa to as high as 11.1 GPa when subjected to annealing near the glass-transition temperature at 450 °C. It was also of good adhesive strength and scratch resistance after the annealing treatment at 400 °C. Transmission electron microscopy results revealed annealing-induced nanocrystals that accounted for such superior mechanical properties. With the above unique properties, Zr-Ti-Ni thin film metallic glass has the potential for the fabrication of high strength micro parts and protective coating. © 2014 Elsevier B.V.

AB - Zr46Ti26Ni28 thin film metallic glass was fabricated by radio frequency magnetron single target sputtering on Si and stainless steel substrates. The as-deposited film was found to be fully amorphous with high glass transition and crystallization temperatures of 466 °C and 502 °C, respectively. Its hardness progressively increased from 6.2 GPa to as high as 11.1 GPa when subjected to annealing near the glass-transition temperature at 450 °C. It was also of good adhesive strength and scratch resistance after the annealing treatment at 400 °C. Transmission electron microscopy results revealed annealing-induced nanocrystals that accounted for such superior mechanical properties. With the above unique properties, Zr-Ti-Ni thin film metallic glass has the potential for the fabrication of high strength micro parts and protective coating. © 2014 Elsevier B.V.

KW - Amorphous alloys

KW - Annealing

KW - Hardness measurement

KW - Mechanical characterization

KW - Nanoindentation

KW - Shear bands

UR - http://www.scopus.com/inward/record.url?scp=84900466432&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84900466432&origin=recordpage

U2 - 10.1016/j.msea.2014.03.144

DO - 10.1016/j.msea.2014.03.144

M3 - RGC 21 - Publication in refereed journal

SN - 0921-5093

VL - 608

SP - 258

EP - 264

JO - Materials Science & Engineering A

JF - Materials Science & Engineering A

ER -

Effects of annealing on mechanical behavior of Zr–Ti–Ni thin film metallic glasses

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GRF: Thermal Plastic Imprinting of Bulk Metallic Glass for Fabrication of Terahertz Plasmonic Devices

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Effects of annealing on mechanical behavior of Zr–Ti–Ni thin film metallic glasses

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GRF: Thermal Plastic Imprinting of Bulk Metallic Glass for Fabrication of Terahertz Plasmonic Devices

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