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Effect of Void in the Anisotropic Conductive Assembly

NH Yeung, YC Chan, Sai Choo TAN, KK Lee, KK Chan

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)

Abstract

The design of the ACF is used for very fine pitch application in the microelectronic industry such as flip chip technology. During the bonding process, bumps on the chip and pads on the substrate has been first aligned and then heat and pressure have been applied so as to apply thermal energy to the ACF for curing and to make a plastic and permanent deformation of the conductive particles. Consequently, a permanent mechanical contact can be formed between the bumps and the pads allowing the flow of electric field. In this study, the FC assembly using ACF was assumed to be a visco-elastic material subjected to various void sizes, which were entrapped inside the ACF. A finite element method is used to analyze the stresses in the FC assembly. The result found that the smaller the void size, the larger the stress concentration. Also, the von mises stress is larger at the upper position than the lower position. It implies that the four corners of a void is seen to be a preferable site for crack initiation, propagation and possibly failure to occur. Moreover, temperature profile of the reflow and the location of the void would also affect the stress level of the ACF.
Original languageEnglish
Title of host publication2003 Proceedings 53rd Electronic Components & Technology Conference
PublisherIEEE
Pages1378-1382
ISBN (Electronic)0780379923
ISBN (Print)0780377915, 0780374304
DOIs
Publication statusPublished - May 2003
Event53rd Electronic Components and Technology Conference, 2003 - New Orleans, United States
Duration: 27 May 200330 May 2003

Publication series

NameProceedings - Electronic Components and Technology Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISSN (Print)0569-5503

Conference

Conference53rd Electronic Components and Technology Conference, 2003
Abbreviated titleECTC
PlaceUnited States
CityNew Orleans
Period27/05/0330/05/03

Research Keywords

  • ACF
  • Void
  • Von Mises stress
  • Finite Element Method
  • Reflow

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