Effect of tantalum content of titanium oxide film fabricated by magnetron sputtering on the behavior of cultured human umbilical vein endothelial cells (HUVEC)

J. Y. Chen, Y. X. Leng, X. Zhang, P. Yang, H. Sun, J. Wang, G. J. Wan, A. S. Zhao, N. Huang, P. K. Chu

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    11 Citations (Scopus)

    Abstract

    In this work, we synthesized titanium oxide thin films containing different tantalum using magnetron sputtering to meet the challenge of enhanced biocompatibility. The structure characteristics of the films were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The biological behavior of human umbilical vein endothelial cells (HUVECs) on the film surface was investigated by in vitro cell culture. Study of cultured HUVEC onto films revealed that the growth and proliferation behavior of EC were varied significantly due to the different Ta content which resulting the characterization of films is different. The adherence, growth, shape and proliferation of EC on Ti-O film with high Ta content and smoother surface was excellent. © 2005 Elsevier B.V. All rights reserved.
    Original languageEnglish
    Pages (from-to)26-29
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume242
    Issue number1-2
    Online published21 Sept 2005
    DOIs
    Publication statusPublished - Jan 2006
    Event14th International Conference on Ion Beam Modification of Materials (IBMM 2004)
    - Asilomar Conference Center, Monterey, United States
    Duration: 5 Sept 200410 Sept 2004
    https://digital.library.unt.edu/ark:/67531/metadc873488/m2/1/high_res_d/883566.pdf

    Research Keywords

    • Characteristics
    • Endothelial cells
    • Magnetron sputtering
    • Tantalum content
    • Titanium oxide film

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