Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

Y. G. Shen; Z. J. Liu; N. Jiang; H. S. Zhang; K. H. Chan; Z. K. Xu

doi:10.1557/jmr.2004.19.2.523

Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

Y. G. Shen, Z. J. Liu, N. Jiang, H. S. Zhang, K. H. Chan, Z. K. Xu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

31 Citations (Scopus)

Abstract

The effect of the amount of Si added to TiN on bonding structure, roughening kinetics and structural properties of the Ti_1-x-ySi _xN_y films was investigated. The nanocomposite films were grown by reactive unbalanced direct current-magnetron sputtering. The energy dispersive x-ray (EDX) analysis, X-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to study the chemical bonding, microstructure and roughening kinetics of the films. It was observed that an increase in the Si concentration resulted in a decrease in the crystalline TiN grains.

Original language	English
Pages (from-to)	523-534
Journal	Journal of Materials Research
Volume	19
Issue number	2
DOIs	https://doi.org/10.1557/jmr.2004.19.2.523
Publication status	Published - Feb 2004

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title = "Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering",

abstract = "The effect of the amount of Si added to TiN on bonding structure, roughening kinetics and structural properties of the Ti1-x-ySi xNy films was investigated. The nanocomposite films were grown by reactive unbalanced direct current-magnetron sputtering. The energy dispersive x-ray (EDX) analysis, X-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to study the chemical bonding, microstructure and roughening kinetics of the films. It was observed that an increase in the Si concentration resulted in a decrease in the crystalline TiN grains.",

author = "Shen, {Y. G.} and Liu, {Z. J.} and N. Jiang and Zhang, {H. S.} and Chan, {K. H.} and Xu, {Z. K.}",

year = "2004",

month = feb,

doi = "10.1557/jmr.2004.19.2.523",

language = "English",

volume = "19",

pages = "523--534",

journal = "Journal of Materials Research",

issn = "0884-2914",

publisher = "Springer International Publishing ",

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}

Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering. / Shen, Y. G.; Liu, Z. J.; Jiang, N. et al.
In: Journal of Materials Research, Vol. 19, No. 2, 02.2004, p. 523-534.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

TY - JOUR

T1 - Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

AU - Shen, Y. G.

AU - Liu, Z. J.

AU - Jiang, N.

AU - Zhang, H. S.

AU - Chan, K. H.

AU - Xu, Z. K.

PY - 2004/2

Y1 - 2004/2

N2 - The effect of the amount of Si added to TiN on bonding structure, roughening kinetics and structural properties of the Ti1-x-ySi xNy films was investigated. The nanocomposite films were grown by reactive unbalanced direct current-magnetron sputtering. The energy dispersive x-ray (EDX) analysis, X-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to study the chemical bonding, microstructure and roughening kinetics of the films. It was observed that an increase in the Si concentration resulted in a decrease in the crystalline TiN grains.

AB - The effect of the amount of Si added to TiN on bonding structure, roughening kinetics and structural properties of the Ti1-x-ySi xNy films was investigated. The nanocomposite films were grown by reactive unbalanced direct current-magnetron sputtering. The energy dispersive x-ray (EDX) analysis, X-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to study the chemical bonding, microstructure and roughening kinetics of the films. It was observed that an increase in the Si concentration resulted in a decrease in the crystalline TiN grains.

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-1842715159&origin=recordpage

U2 - 10.1557/jmr.2004.19.2.523

DO - 10.1557/jmr.2004.19.2.523

M3 - RGC 21 - Publication in refereed journal

SN - 0884-2914

VL - 19

SP - 523

EP - 534

JO - Journal of Materials Research

JF - Journal of Materials Research

IS - 2

ER -

Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering

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