Effect of plasma treatment on surface properties of TiO2 nanoparticulate films

Yaan Cao, Qingjiu Meng, Wensheng Yang, Jianghong Yao, Yongchun Shu, Wei Wang, Guohua Chen

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

23 Citations (Scopus)

Abstract

TiO2 nanoparticle films were prepared by plasma-enhanced chemical vapor deposition, and subsequently, their surfaces were treated by TiCl4 and O2 plasmas, respectively. Experiments of phenol photodegradation show that the TiO2 film treated by O2 plasma presents much higher photocatalytic activity than that treated by TiCl4 plasma. X-ray photoelectron spectral analyses indicate that more active species, such as O2-, are formed on surface of the film treated by O2 plasma than that treated by TiCl4 plasma. The energy levels of the surface species and the photogenerated electronic transitions via these surface species are further investigated by surface photovoltage spectra (SPS) and electric field-induced surface photovoltage spectra (EFISPS). © 2005 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)181-186
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume262
Issue number1-3
DOIs
Publication statusPublished - 15 Jul 2005
Externally publishedYes

Bibliographical note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Research Keywords

  • PCVD
  • Photocatalytic activity
  • Surface species
  • TiO2 nanoparticulate film

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