Effect of plasma treatment on surface properties of TiO2 nanoparticulate films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Yaan Cao
  • Qingjiu Meng
  • Wensheng Yang
  • Jianghong Yao
  • Yongchun Shu
  • Wei Wang

Detail(s)

Original languageEnglish
Pages (from-to)181-186
Journal / PublicationColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume262
Issue number1-3
Publication statusPublished - 15 Jul 2005
Externally publishedYes

Abstract

TiO2 nanoparticle films were prepared by plasma-enhanced chemical vapor deposition, and subsequently, their surfaces were treated by TiCl4 and O2 plasmas, respectively. Experiments of phenol photodegradation show that the TiO2 film treated by O2 plasma presents much higher photocatalytic activity than that treated by TiCl4 plasma. X-ray photoelectron spectral analyses indicate that more active species, such as O2-, are formed on surface of the film treated by O2 plasma than that treated by TiCl4 plasma. The energy levels of the surface species and the photogenerated electronic transitions via these surface species are further investigated by surface photovoltage spectra (SPS) and electric field-induced surface photovoltage spectra (EFISPS). © 2005 Elsevier B.V. All rights reserved.

Research Area(s)

  • PCVD, Photocatalytic activity, Surface species, TiO2 nanoparticulate film

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Effect of plasma treatment on surface properties of TiO2 nanoparticulate films. / Cao, Yaan; Meng, Qingjiu; Yang, Wensheng et al.

In: Colloids and Surfaces A: Physicochemical and Engineering Aspects, Vol. 262, No. 1-3, 15.07.2005, p. 181-186.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review