Effect of oxygen flow rate on properties of Cu4O3 thin films fabricated by radio frequency magnetron sputtering

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

8 Scopus Citations
View graph of relations

Author(s)

  • Md Abdul Majed Patwary
  • Katsuhiko Saito
  • Qixin Guo
  • Wladek Walukiewicz
  • Tooru Tanaka

Detail(s)

Original languageEnglish
Article number085302
Journal / PublicationJournal of Applied Physics
Volume127
Issue number8
Publication statusPublished - 24 Feb 2020

Abstract

Cu4O3 thin films have been synthesized in an ambient of Ar and O2 plasma using a pure Cu target by radio frequency magnetron sputtering. The structural, electrical, and optical properties of the films were studied systematically as a function of O2 gas flow. The study reveals that O2 flow rate (RO2 ) during sputtering has major impacts on both the composition and functional properties of the resultant Cu4O3 thin films. X-ray diffraction and Raman spectroscopy measurements suggest that the parameter window for the growth of single-phase Cu4Othin films was very narrow. Oxygen partial pressure of 7.9%–9.1% was required to grow the pure phase of Cu4O3. From optical absorption analyses, pure phase Cu4O3 films exhibited a direct transition at Eg= 1.52–1.62 eV. All the Cu4O3 thin films showed p-type conductivity with resistivities in the order of 102 –103 Ω cm. An increase of RO2 resulted in the increase of the Hall mobility from 0.01 to 0.25 cm2 /V s, which is the highest mobility reported so far for this material. These results indicate clearly that Cu4O3 is a semiconductor with a high potential as absorber materials in low-cost thin film photovoltaics.

Citation Format(s)

Effect of oxygen flow rate on properties of Cu4O3 thin films fabricated by radio frequency magnetron sputtering. / Patwary, Md Abdul Majed; Ho, Chun Yuen; Saito, Katsuhiko; Guo, Qixin; Yu, Kin Man; Walukiewicz, Wladek; Tanaka, Tooru.

In: Journal of Applied Physics, Vol. 127, No. 8, 085302, 24.02.2020.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review