Effect of nitrogen content on nanostructure and mechanical properties of TiCxNy thin films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

3 Scopus Citations
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Detail(s)

Original languageEnglish
Pages (from-to)169-173
Journal / PublicationSurface Engineering
Volume27
Issue number3
Publication statusPublished - Apr 2011

Abstract

A series of TiCxNy thin films were deposited at 500°C on Si (100) substrates by way of incorporation of different amounts of nitrogen into TiC0.45 using reactive unbalanced dc magnetron sputtering method. Their phase configurations, microstructures and mechanical behaviours were subsequently investigated by X-ray diffraction, X-ray photoelectron spectroscopy and microindentation methods. The result indicated that TiC0.45 showed a fcc-like B-NaCl polycrystallite, and a solid solution nanocrystalline (nc-) TiCxNy with the same structure was formed by way of dissolution of nitrogen into TiC0.45 lattice when the atomic ratio of (CzN)/Ti was less than one unit. Both hardness and residual compressive stress values were increased with increasing N content. Their maximums were believed to be obtained at nc-Ti(C,N) solid solution with an atomic ratio of one unit. Enhancement of both of them was attributed to solid solution. © 2011.

Research Area(s)

  • Microhardness, Nanostructure, Residual stress, Solid solution, TiC xNy thin films