Effect of hydrogen etching on different carbon and boron nitride phases

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Pages (from-to)227-230
Journal / PublicationAdvanced Materials
Volume12
Issue number19
Publication statusPublished - Oct 2000

Abstract

The role of hydrogen species during the chemical vapor deposition (CVD) growth of BN films was studied by comparing the reactivities between different hydrogen species and two BN phases. For purposes of comparison, a corresponding study on two different carbon phases was also performed. Hexagonal and tetrahedral clusters of different sizes were used to mimic the sp2 and sp3 BN phases. Results indicate that, instead of finding a selective sp2 etching agent for BN phases, the successful CVD synthesis of single-phase BN films may be better achieved by promoting the formation of the sp3 phase.

Citation Format(s)

Effect of hydrogen etching on different carbon and boron nitride phases. / Zhang, R. Q.; Chu, T. S.; Lee, C. S. et al.
In: Advanced Materials, Vol. 12, No. 19, 10.2000, p. 227-230.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review