Effect of annealing temperature on microstructure, hardness and adhesion properties of TiSixNy superhard coatings

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

  • Y. H. Lu
  • J. P. Wang
  • S. L. Tao
  • Z. F. Zhou

Detail(s)

Original languageEnglish
Pages (from-to)6380-6386
Journal / PublicationApplied Surface Science
Volume257
Issue number15
Publication statusPublished - 15 May 2011

Abstract

A series of TiSixNy superhard coatings with different Si contents were prepared on M42 steel substrates using two Ti and two Si targets by reactive magnetron sputtering at 500 °C. These samples were subsequently vacuum-annealed at 500, 600, 700, 800 and 900 °C, respectively. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), microindenter, Rockwell hardness tester and scratch tester were applied to investigate the microstructure, phase configuration, hardness and adhesion properties of as-deposited and annealed samples. The results indicated that there were two bonds, TiN and Si3N4, in all presently deposited TiSi xNy thin films, that structure was nanocomposite of nanocrystalline (nc-) TiN embedded into amorphous Si3N4 matrices. Annealing treatment below 900 °C played a little role in microstructure and hardness of the coatings although it greatly affected those of steel substrates. The film-substrate adhesion strength was slightly increased, followed by an abrupt decrease with increasing annealing temperature. Its value got to the maximum at 600 °C. Annealing had little effect on the friction coefficient with its value varying in the range of 0.39-0.40. © 2011 Elsevier B.V.

Research Area(s)

  • Adhesion, Annealing treatment, Microstructure, Nanocomposite, TiSixNy

Citation Format(s)

Effect of annealing temperature on microstructure, hardness and adhesion properties of TiSixNy superhard coatings. / Lu, Y. H.; Wang, J. P.; Tao, S. L.; Zhou, Z. F.

In: Applied Surface Science, Vol. 257, No. 15, 15.05.2011, p. 6380-6386.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal