TY - JOUR
T1 - Effect of a substrate on the phase transformations of amorphous TiSi2 thin films
AU - Thompson, R. D.
AU - Takai, H.
AU - Psaras, P. A.
AU - Tu, K. N.
N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].
PY - 1987/1/15
Y1 - 1987/1/15
N2 - The crystallization of an amorphous TiSi2 evaporated film has been studied on both poly-Si and SiO2 substrates. A metastable form of TiSi2 (base-centered orthorhombic; a=3.62 A, b=13.76 A, and c=3.605 A) [P. G. Cotter, J. H. Kohn, and R. A. Potter, J. Am. Ceram. Soc. 39, 11 (1956)] is formed first at a temperature of approximately 350 °C on both substrates. This phase consumes the entire amorphous layer before undergoing a polymorphic transformation to face-centered orthorhombic TiSi2 (a=8.24 A, b=4.78 A, and c=8.54 A) [F. Laves and H. J. Wallbaum, Z. Kristallogr. 101, 78 (1979)] at 600 and 800 °C on poly-Si and SiO2, respectively. These transformations were investigated using in situ resistivity, x-ray diffraction, and transmission electron microscopy. The room-temperature resistivities observed were 96 and 20 μΩ cm for the base-centered and face-centered TiSi2, respectively. The enhanced polymorphic transformation on poly-Si over SiO2 is explained by a lowering of surface energy barrier to nucleation.
AB - The crystallization of an amorphous TiSi2 evaporated film has been studied on both poly-Si and SiO2 substrates. A metastable form of TiSi2 (base-centered orthorhombic; a=3.62 A, b=13.76 A, and c=3.605 A) [P. G. Cotter, J. H. Kohn, and R. A. Potter, J. Am. Ceram. Soc. 39, 11 (1956)] is formed first at a temperature of approximately 350 °C on both substrates. This phase consumes the entire amorphous layer before undergoing a polymorphic transformation to face-centered orthorhombic TiSi2 (a=8.24 A, b=4.78 A, and c=8.54 A) [F. Laves and H. J. Wallbaum, Z. Kristallogr. 101, 78 (1979)] at 600 and 800 °C on poly-Si and SiO2, respectively. These transformations were investigated using in situ resistivity, x-ray diffraction, and transmission electron microscopy. The room-temperature resistivities observed were 96 and 20 μΩ cm for the base-centered and face-centered TiSi2, respectively. The enhanced polymorphic transformation on poly-Si over SiO2 is explained by a lowering of surface energy barrier to nucleation.
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U2 - 10.1063/1.338254
DO - 10.1063/1.338254
M3 - RGC 21 - Publication in refereed journal
SN - 0021-8979
VL - 61
SP - 540
EP - 544
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 2
ER -