Edge Delamination of Monolayer Transition Metal Dichalcogenides

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)7534-7541
Journal / PublicationACS Nano
Volume11
Issue number7
Online published11 Jul 2017
Publication statusPublished - 25 Jul 2017

Abstract

Delamination of thin films from the supportive substrates is a critical issue within the thin film industry. The emergent two-dimensional, atomic layered materials, including transition metal dichalcogenides, are highly flexible; thus buckles and wrinkles can be easily generated and play vital roles in the corresponding physical properties. Here we introduce one kind of patterned buckling behavior caused by the delamination from a substrate initiated at the edges of the chemical vapor deposition synthesized monolayer transition metal dichalcogenides, led by thermal expansion mismatch. The atomic force microscopy and optical characterizations clearly showed the puckered structures associated with the strain, whereas the transmission electron microscopy revealed the special sawtooth-shaped edges, which break the geometrical symmetry for the buckling behavior of hexagonal samples. The condition of the edge delamination is in accordance with the fracture behavior of thin film interfaces. This edge delamination and buckling process is universal for most ultrathin two-dimensional materials, which requires more attention in various future applications.

Research Area(s)

  • AFM, edge delaminate, molybdenum disulfide, PL, TEM, tungsten disulfide

Citation Format(s)

Edge Delamination of Monolayer Transition Metal Dichalcogenides. / Ly, Thuc Hue; Yun, Seok Joon; Thi, Quoc Huy; Zhao, Jiong.

In: ACS Nano, Vol. 11, No. 7, 25.07.2017, p. 7534-7541.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review