Abstract
A tight binding Hamiltonian was used to obtain an analytic expression for the buildup process in inelastic resonant tunneling. The buildup process was described by the summation of a number of oscillation terms guided by an exponential buildup envelope. The results show the presence of a nonexponential buildup process near the resonant peak, with a buildup rate faster than that of the exponential envelope.
| Original language | English |
|---|---|
| Pages (from-to) | 692-694 |
| Journal | Applied Physics Letters |
| Volume | 83 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 28 Jul 2003 |
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