Dynamic transition in the discharge current between gas-dominant discharge and self-sputtering in high-power impulse magnetron sputtering

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

1 Scopus Citations
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Author(s)

  • Zhongzhen Wu
  • Shu Xiao
  • Zhengyong Ma
  • Suihan Cui
  • Feng Pan
  • Xiubo Tian
  • Ricky K.Y. Fu

Detail(s)

Original languageEnglish
Pages (from-to)319-322
Journal / PublicationSurface and Coatings Technology
Volume306
Publication statusPublished - 25 Nov 2016

Abstract

An unstable stage is observed from the discharge current during the transition from gas-dominant discharge to the self-sputtering dominant regime in high-power impulse magnetron sputtering (HiPIMS). The phenomenon and the formation mechanism are time dependent and there is a dynamic transition between the two stable stages. The threshold of the high stable discharge is investigated at different pressure and hybrid DC discharge. According to the derivation of the discharge current, the temperature in the discharge is found to play a major role in the dynamic transition at moderate voltage.

Research Area(s)

  • Discharge current, Dynamic transition, High-power impulse magnetron sputtering, Temperature

Citation Format(s)

Dynamic transition in the discharge current between gas-dominant discharge and self-sputtering in high-power impulse magnetron sputtering. / Wu, Zhongzhen; Xiao, Shu; Ma, Zhengyong; Cui, Suihan; Pan, Feng; Tian, Xiubo; Fu, Ricky K.Y.; Chu, Paul K.

In: Surface and Coatings Technology, Vol. 306, 25.11.2016, p. 319-322.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal