Discharge current modes of high power impulse magnetron sputtering

Zhongzhen Wu; Shu Xiao; Zhengyong Ma; Suihan Cui; Shunping Ji; Xiubo Tian; Ricky K. Y. Fu; Paul K. Chu; Feng Pan

doi:10.1063/1.4932135

Discharge current modes of high power impulse magnetron sputtering

Zhongzhen Wu^*
, Shu Xiao
, Zhengyong Ma
, Suihan Cui
, Shunping Ji
, Xiubo Tian
, Ricky K. Y. Fu
, Paul K. Chu
, Feng Pan

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

17 Citations (Scopus)

70 Downloads (CityUHK Scholars)

Abstract

Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

Original language	English
Article number	97178
Journal	AIP Advances
Volume	5
Issue number	9
DOIs	https://doi.org/10.1063/1.4932135
Publication status	Published - 1 Sept 2015

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title = "Discharge current modes of high power impulse magnetron sputtering",

abstract = "Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.",

author = "Zhongzhen Wu and Shu Xiao and Zhengyong Ma and Suihan Cui and Shunping Ji and Xiubo Tian and Fu, \{Ricky K. Y.\} and Chu, \{Paul K.\} and Feng Pan",

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T1 - Discharge current modes of high power impulse magnetron sputtering

AU - Wu, Zhongzhen

AU - Xiao, Shu

AU - Ma, Zhengyong

AU - Cui, Suihan

AU - Ji, Shunping

AU - Tian, Xiubo

AU - Fu, Ricky K. Y.

AU - Chu, Paul K.

AU - Pan, Feng

PY - 2015/9/1

Y1 - 2015/9/1

N2 - Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

AB - Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

UR - https://www.scopus.com/pages/publications/84942803823

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84942803823&origin=recordpage

U2 - 10.1063/1.4932135

DO - 10.1063/1.4932135

M3 - RGC 21 - Publication in refereed journal

SN - 2158-3226

VL - 5

JO - AIP Advances

JF - AIP Advances

IS - 9

M1 - 97178

ER -

Discharge current modes of high power impulse magnetron sputtering

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