Digital pixel cryptogram in E-beam holography

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal

4 Scopus Citations
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Author(s)

  • Tianji Wang
  • Yaotang Li
  • Shining Yang
  • Hongan Feng
  • Shichao Zhang
  • Shaowu Fan
  • N. K. Bao
  • W. H. Wong
  • P. S. Chung

Detail(s)

Original languageEnglish
Pages (from-to)177-183
Journal / PublicationProceedings of SPIE - The International Society for Optical Engineering
Volume3956
Publication statusPublished - 2000
Externally publishedYes

Conference

TitlePractical Holography XIV and Holographic Materials VI
CitySan Jose, CA, USA
Period24 - 25 January 2000

Abstract

A digital pixel cryptogram technology using electron beam lithography (EBL) is described. The digital pixel hologram is constituted by billions more of the encoding diffraction grating. The orientation and frequency of the fine grating are encoded according to the specified regular pattern when writing the grating. Each fine grating cell can be oriented in any one of different directions allowing more possible way combination encoding. The cryptogram is generated by EBL system and it can be applied to fabrication of embossing hologram for anti-counterfeiting and security.

Citation Format(s)

Digital pixel cryptogram in E-beam holography. / Wang, Tianji; Li, Yaotang; Yang, Shining; Feng, Hongan; Zhang, Shichao; Fan, Shaowu; Bao, N. K.; Wong, W. H.; Chan, H. P.; Chung, P. S.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 3956, 2000, p. 177-183.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal