Diffusion of Cathodic Arc Plasma in a Magnetic Filter

Tao Zhang; Paul K. Chu; Ian G. Brown

doi:10.1109/PLASMA.2003.1229977

Diffusion of Cathodic Arc Plasma in a Magnetic Filter

Research output: Journal Publications and Reviews › RGC 22 - Publication in policy or professional journal

Overview

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Author(s)

Tao Zhang
Paul K. Chu
Ian G. Brown

Detail(s)

Original language	English
Journal / Publication	IEEE International Conference on Plasma Science
Publication status	Published - 2003

Conference

Title	2003 IEEE International Conference on Plasma Science
Place	Korea, Republic of
City	Jeju
Period	2 - 5 June 2003

Link(s)

DOI	DOI https://doi.org/10.1109/PLASMA.2003.1229977 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0141927824&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(cf80a90b-6341-4a7b-9af7-677750148a8e).html

Abstract

A model based on Bohm diffusion is developed to investigate the optimal bias of a magnetic filter used in conjunction with a cathodic arc plasma source. Details regarding the derivation of the model as well as experimental results to corroborate the model are presented. According to the model, the optimal bias at which the magnetic duct produces the maximum plasma output is related to the ion speed, ion mass, ion charge state, and plasma density in the filter. Even though the magnetic field is taken into account, it is not a variable in the final equation. Our experimental results confirm that the magnetic field has almost no influence on the optimal bias when the magnetic field is above 400G. The presented work enhances our understanding on the mechanism of plasma transport through the magnetic duct.