TY - JOUR
T1 - Diffusion of Cathodic Arc Plasma in a Magnetic Filter
AU - Zhang, Tao
AU - Chu, Paul K.
AU - Brown, Ian G.
PY - 2003
Y1 - 2003
N2 - A model based on Bohm diffusion is developed to investigate the optimal bias of a magnetic filter used in conjunction with a cathodic arc plasma source. Details regarding the derivation of the model as well as experimental results to corroborate the model are presented. According to the model, the optimal bias at which the magnetic duct produces the maximum plasma output is related to the ion speed, ion mass, ion charge state, and plasma density in the filter. Even though the magnetic field is taken into account, it is not a variable in the final equation. Our experimental results confirm that the magnetic field has almost no influence on the optimal bias when the magnetic field is above 400G. The presented work enhances our understanding on the mechanism of plasma transport through the magnetic duct.
AB - A model based on Bohm diffusion is developed to investigate the optimal bias of a magnetic filter used in conjunction with a cathodic arc plasma source. Details regarding the derivation of the model as well as experimental results to corroborate the model are presented. According to the model, the optimal bias at which the magnetic duct produces the maximum plasma output is related to the ion speed, ion mass, ion charge state, and plasma density in the filter. Even though the magnetic field is taken into account, it is not a variable in the final equation. Our experimental results confirm that the magnetic field has almost no influence on the optimal bias when the magnetic field is above 400G. The presented work enhances our understanding on the mechanism of plasma transport through the magnetic duct.
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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0141927824&origin=recordpage
U2 - 10.1109/PLASMA.2003.1229977
DO - 10.1109/PLASMA.2003.1229977
M3 - RGC 22 - Publication in policy or professional journal
SN - 0730-9244
JO - IEEE International Conference on Plasma Science
JF - IEEE International Conference on Plasma Science
T2 - 2003 IEEE International Conference on Plasma Science
Y2 - 2 June 2003 through 5 June 2003
ER -