Diffusion of arsenic along dislocations in epitaxial silicon films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • David R. Campbell
  • K. N. Tu
  • Robert O. Schwenker

Detail(s)

Original languageEnglish
Pages (from-to)213-220
Journal / PublicationThin Solid Films
Volume25
Issue number1
Publication statusPublished - Jan 1975
Externally publishedYes

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Diffusion of arsenic along dislocations in epitaxial silicon films. / Campbell, David R.; Tu, K. N.; Schwenker, Robert O.

In: Thin Solid Films, Vol. 25, No. 1, 01.1975, p. 213-220.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review