Diffusion of arsenic along dislocations in epitaxial silicon films

David R. Campbell, K. N. Tu, Robert O. Schwenker

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

12 Citations (Scopus)
Original languageEnglish
Pages (from-to)213-220
JournalThin Solid Films
Volume25
Issue number1
DOIs
Publication statusPublished - Jan 1975
Externally publishedYes

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