Difficulty involved to observe the surface smoothing effect of an amorphous High-k dielectric thin film deposited by atomic layer deposition on a metastable metal film

W.S. Lau*, L. Du, H. Wong, S. Dong

*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

3 Citations (Scopus)

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