Difficulty involved to observe the surface smoothing effect of an amorphous High-k dielectric thin film deposited by atomic layer deposition on a metastable metal film
Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review
Author(s)
Related Research Unit(s)
Detail(s)
| Original language | English |
|---|---|
| Title of host publication | China Semiconductor Technology International Conference 2019 (CSTIC 2019) |
| Editors | Cor Claeys, Ru Huang, Hanming Wu, Qinghuang Lin, Steve Liang, Peilin Song, Zhen Guo, Kafai Lai, Ying Zhang, Xinping Qu, Hsiang-Lan Lung, Wenjian Yu |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. |
| ISBN (electronic) | 9781538674437 |
| Publication status | Published - Mar 2019 |
Publication series
| Name | China Semiconductor Technology International Conference, CSTIC |
|---|
Conference
| Title | China Semiconductor Technology International Conference (CSTIC) 2019 |
|---|---|
| Location | Shanghai International Convention Center |
| Place | China |
| City | Shanghai |
| Period | 18 - 19 March 2019 |
Link(s)
Abstract
In this paper, convincing experimental data showing the surface smoothing effect of an amorphous high-k thin film deposited by atomic layer deposition (ALD) on a metastable metal film are provided even though there exist apparently contradictory data from atomic force microscopy (AFM).
Citation Format(s)
Difficulty involved to observe the surface smoothing effect of an amorphous High-k dielectric thin film deposited by atomic layer deposition on a metastable metal film. / Lau, W.S.; Du, L.; Wong, H. et al.
China Semiconductor Technology International Conference 2019 (CSTIC 2019). ed. / Cor Claeys; Ru Huang; Hanming Wu; Qinghuang Lin; Steve Liang; Peilin Song; Zhen Guo; Kafai Lai; Ying Zhang; Xinping Qu; Hsiang-Lan Lung; Wenjian Yu. Institute of Electrical and Electronics Engineers, Inc., 2019. 8755645 (China Semiconductor Technology International Conference, CSTIC).
China Semiconductor Technology International Conference 2019 (CSTIC 2019). ed. / Cor Claeys; Ru Huang; Hanming Wu; Qinghuang Lin; Steve Liang; Peilin Song; Zhen Guo; Kafai Lai; Ying Zhang; Xinping Qu; Hsiang-Lan Lung; Wenjian Yu. Institute of Electrical and Electronics Engineers, Inc., 2019. 8755645 (China Semiconductor Technology International Conference, CSTIC).
Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review
