Development of a distributed process mining system for reactive ion etching enhancement

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with host publication)peer-review

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Author(s)

Detail(s)

Original languageEnglish
Title of host publication2006 IEEE International Conference on Industrial Informatics, INDIN'06
Pages282-287
Publication statusPublished - 2007
Externally publishedYes

Conference

Title2006 IEEE International Conference on Industrial Informatics, INDIN'06
PlaceSingapore
CitySingapore
Period16 - 18 August 2006

Abstract

A Distributed Process Mining System (DPMS) is discussed in this paper which aims to optimize the process in order to offer shorter production time, easier quality defect identification and higher customer satisfaction. This proposed system is equipped with the idea of "distributed process mining" discovering the hidden relationships between each working decision in distributed manner. This method incorporates the On-line Analytical Processing (OLAP) and the decision tree-based Artificial Neural Networks (ANNs) algorithms into decision making for ensuring "doing the right things" within the process and relevant workflow. A case study of using Reactive Ion Etching (RIE) in a magnetic head manufacturer is included. © 2006 IEEE.

Citation Format(s)

Development of a distributed process mining system for reactive ion etching enhancement. / Tsang, K. F.; Lau, Henry C. W.; Kwok, S. K.
2006 IEEE International Conference on Industrial Informatics, INDIN'06. 2007. p. 282-287 4053401.

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with host publication)peer-review