Design of freeform lens with TFMG reflector for UV-LEDs lithography system

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • C.T. Pan
  • T.L. Yang
  • Y.C. Chen
  • C.M. Chang
  • J.H. Hsu

Detail(s)

Original languageEnglish
Pages (from-to)6850-6857
Journal / PublicationOptik
Volume127
Issue number17
Online published4 May 2016
Publication statusPublished - Sep 2016
Externally publishedYes

Abstract

A freeform lens with inclined reflector coated with Al-Ni-Y thin film metallic glass (TFMG) was proposed to improve the irradiance and uniformity of an ultraviolet light-emitting diode (UV-LEDs) lithography system. Polydimethylsiloxane (PDMS) was adopted as lens materials. The lens mold was fabricated by 3-D printing method. Besides, a recipe of TFMG with 88% reflectivity was determined to enhance the exposure performance. The results show the average irradiance and uniformity with 60° inclined reflector were 8.7 mW/cm2 and 82%, respectively. The system with 60° inclined reflector layer can achieve 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement.

Research Area(s)

  • 3-D printing, Freeform lens, Light-emitting diode, Lithography system, Thin film metallic glasses

Citation Format(s)

Design of freeform lens with TFMG reflector for UV-LEDs lithography system. / Pan, C.T.; Yang, T.L.; Chen, Y.C.; Chang, C.M.; Hsu, J.H.; Huang, J.C.

In: Optik, Vol. 127, No. 17, 09.2016, p. 6850-6857.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review