Design of freeform lens with TFMG reflector for UV-LEDs lithography system

C.T. Pan; T.L. Yang; Y.C. Chen; C.M. Chang; J.H. Hsu; J.C. Huang

doi:10.1016/j.ijleo.2016.04.110

Design of freeform lens with TFMG reflector for UV-LEDs lithography system

C.T. Pan^*, T.L. Yang, Y.C. Chen, C.M. Chang, J.H. Hsu, J.C. Huang

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

6 Citations (Scopus)

Abstract

A freeform lens with inclined reflector coated with Al-Ni-Y thin film metallic glass (TFMG) was proposed to improve the irradiance and uniformity of an ultraviolet light-emitting diode (UV-LEDs) lithography system. Polydimethylsiloxane (PDMS) was adopted as lens materials. The lens mold was fabricated by 3-D printing method. Besides, a recipe of TFMG with 88% reflectivity was determined to enhance the exposure performance. The results show the average irradiance and uniformity with 60° inclined reflector were 8.7 mW/cm² and 82%, respectively. The system with 60° inclined reflector layer can achieve 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement.

Original language	English
Pages (from-to)	6850-6857
Journal	Optik
Volume	127
Issue number	17
Online published	4 May 2016
DOIs	https://doi.org/10.1016/j.ijleo.2016.04.110
Publication status	Published - Sept 2016
Externally published	Yes

Research Keywords

3-D printing
Freeform lens
Light-emitting diode
Lithography system
Thin film metallic glasses

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10.1016/j.ijleo.2016.04.110

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@article{3e52f543e34840fea643a16da5952e2d,

title = "Design of freeform lens with TFMG reflector for UV-LEDs lithography system",

abstract = "A freeform lens with inclined reflector coated with Al-Ni-Y thin film metallic glass (TFMG) was proposed to improve the irradiance and uniformity of an ultraviolet light-emitting diode (UV-LEDs) lithography system. Polydimethylsiloxane (PDMS) was adopted as lens materials. The lens mold was fabricated by 3-D printing method. Besides, a recipe of TFMG with 88% reflectivity was determined to enhance the exposure performance. The results show the average irradiance and uniformity with 60° inclined reflector were 8.7 mW/cm2 and 82%, respectively. The system with 60° inclined reflector layer can achieve 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement.",

keywords = "3-D printing, Freeform lens, Light-emitting diode, Lithography system, Thin film metallic glasses",

author = "C.T. Pan and T.L. Yang and Y.C. Chen and C.M. Chang and J.H. Hsu and J.C. Huang",

year = "2016",

month = sep,

doi = "10.1016/j.ijleo.2016.04.110",

language = "English",

volume = "127",

pages = "6850--6857",

journal = "Optik",

issn = "0030-4026",

publisher = "Elsevier GmbH",

number = "17",

}

TY - JOUR

T1 - Design of freeform lens with TFMG reflector for UV-LEDs lithography system

AU - Pan, C.T.

AU - Yang, T.L.

AU - Chen, Y.C.

AU - Chang, C.M.

AU - Hsu, J.H.

AU - Huang, J.C.

PY - 2016/9

Y1 - 2016/9

N2 - A freeform lens with inclined reflector coated with Al-Ni-Y thin film metallic glass (TFMG) was proposed to improve the irradiance and uniformity of an ultraviolet light-emitting diode (UV-LEDs) lithography system. Polydimethylsiloxane (PDMS) was adopted as lens materials. The lens mold was fabricated by 3-D printing method. Besides, a recipe of TFMG with 88% reflectivity was determined to enhance the exposure performance. The results show the average irradiance and uniformity with 60° inclined reflector were 8.7 mW/cm2 and 82%, respectively. The system with 60° inclined reflector layer can achieve 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement.

AB - A freeform lens with inclined reflector coated with Al-Ni-Y thin film metallic glass (TFMG) was proposed to improve the irradiance and uniformity of an ultraviolet light-emitting diode (UV-LEDs) lithography system. Polydimethylsiloxane (PDMS) was adopted as lens materials. The lens mold was fabricated by 3-D printing method. Besides, a recipe of TFMG with 88% reflectivity was determined to enhance the exposure performance. The results show the average irradiance and uniformity with 60° inclined reflector were 8.7 mW/cm2 and 82%, respectively. The system with 60° inclined reflector layer can achieve 97.5% average normalized cross correlation (NCC) between the simulation and experimental measurement.

KW - 3-D printing

KW - Freeform lens

KW - Light-emitting diode

KW - Lithography system

KW - Thin film metallic glasses

UR - http://www.scopus.com/inward/record.url?scp=84968902055&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84968902055&origin=recordpage

U2 - 10.1016/j.ijleo.2016.04.110

DO - 10.1016/j.ijleo.2016.04.110

M3 - RGC 21 - Publication in refereed journal

SN - 0030-4026

VL - 127

SP - 6850

EP - 6857

JO - Optik

JF - Optik

IS - 17

ER -

Design of freeform lens with TFMG reflector for UV-LEDs lithography system

Abstract

Research Keywords

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