Deposition of silver thin films using the pyrazolate complex [Ag(3,5-(CF₃)₂C₃HN₂)]₃

The synthesis and characterization of a series of silver pyrazolate complexes [Ag(tfpz)]₃ (1), [Ag(fbpz)]₃ (2), [Ag(dbpz)]₃ (3), and [(py) Ag(tfpz)]₂ (4) are reported, for which tfpz, fbpz, dbpz are abbreviations for the pyrazolate ligands with formulae 3,5-(CF₃)_2-pz, 3-^tBu-5-(CF ₃)-pz, and 3,5-(^tBu)2-pz, respectively. These silver complexes were characterized by microanalysis and spectroscopic methods. The CF₃-substituted complex 1 possesses the highest volatility and stability against thermal decomposition. Low pressure CVD experiments were conducted over the temperature range 250-350 °C. Silver metal thin films were successfully obtained on silicon wafers using pure H₂ as the carrier gas. Scanning electron microscopy (SEM) was used to reveal surface morphologies, while X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were utilized to determine the atomic composition of the as-deposited thin films as well as the crystallite packing.