Deposition of Iridium Thin Films Using New IrI CVD Precursors

Yao-Lun Chen; Chao-Shiuan Liu; Yun Chi; Arthur J. Carty; Shie-Ming Peng; Gene-Hsiang Lee

doi:10.1002/1521-3862(20020116)8:1<17::aid-cvde17>3.0.co;2-3

Deposition of Iridium Thin Films Using New Ir^I CVD Precursors

Yao-Lun Chen, Chao-Shiuan Liu, Yun Chi, Arthur J. Carty, Shie-Ming Peng, Gene-Hsiang Lee

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Original language	English
Pages (from-to)	17-20
Journal	Chemical Vapor Deposition
Volume	8
Issue number	1
Online published	18 Jan 2002
DOIs	https://doi.org/10.1002/1521-3862(20020116)8:1<17::aid-cvde17>3.0.co;2-3
Publication status	Published - Jan 2002
Externally published	Yes

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@article{1efb01170bd0463aa6d28ccc281b368b,

title = "Deposition of Iridium Thin Films Using New IrI CVD Precursors",

author = "Yao-Lun Chen and Chao-Shiuan Liu and Yun Chi and Carty, {Arthur J.} and Shie-Ming Peng and Gene-Hsiang Lee",

year = "2002",

month = jan,

doi = "10.1002/1521-3862(20020116)8:1<17::aid-cvde17>3.0.co;2-3",

language = "English",

volume = "8",

pages = "17--20",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag GmbH",

number = "1",

}

TY - JOUR

T1 - Deposition of Iridium Thin Films Using New IrI CVD Precursors

AU - Chen, Yao-Lun

AU - Liu, Chao-Shiuan

AU - Chi, Yun

AU - Carty, Arthur J.

AU - Peng, Shie-Ming

AU - Lee, Gene-Hsiang

PY - 2002/1

Y1 - 2002/1

UR - http://www.scopus.com/inward/record.url?scp=0002451171&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0002451171&origin=recordpage

U2 - 10.1002/1521-3862(20020116)8:1<17::aid-cvde17>3.0.co;2-3

DO - 10.1002/1521-3862(20020116)8:1<17::aid-cvde17>3.0.co;2-3

M3 - RGC 21 - Publication in refereed journal

SN - 0948-1907

VL - 8

SP - 17

EP - 20

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 1