Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source

H. F. Jiang; X. B. Tian; S. Q. Yang; R. K. Y. Fu; Paul K. Chu

doi:10.1109/PLASMA.2008.4590718

Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source

H. F. Jiang
, X. B. Tian^*
, S. Q. Yang
, R. K. Y. Fu
, Paul K. Chu^*

^*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

Diamond-like carbon (DLC) films are deposited on AISI 304 stainless steel substrates using hollow cathode chemical vapor deposition (CVD). The substrate bias voltage is varied from 0 to -200 V to investigate its effect on the structural and mechanical properties of the films. Raman spectra show the formation of the G (graphite) peak and D (disorder) peak in the films. X-ray photoelectron spectroscopy (XPS) data also confirm the existence of C=C (sp²) and C-C (sp³) bonds. Our experiments show that the sample bias has a critical influence on the thickness and hardness of the deposited films. The largest thickness (1700 nm) and the highest hardness (HV1099) are achieved at a bias voltage of -50 V. All the films show low friction coefficients and the sample treated at -200 V exhibits the lowest friction coefficient. The enhancement mechanism is also described.

Original language	English
Title of host publication	Proceedings of the 35th IEEE International Conference on Plasma Science (ICOPS 2008)
Pages	179
DOIs	https://doi.org/10.1109/PLASMA.2008.4590718
Publication status	Published - 15 Jun 2008
Event	35th IEEE International Conference on Plasma Science (ICOPS 2008) - Karlsruhe, Germany Duration: 15 Jun 2008 → 19 Jun 2008

Conference

Conference	35th IEEE International Conference on Plasma Science (ICOPS 2008)
Place	Germany
City	Karlsruhe
Period	15/06/08 → 19/06/08

Research Keywords

Diamond-like carbon

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10.1109/PLASMA.2008.4590718

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@inproceedings{7a9786f158744340a76141edeea98ef2,

title = "Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source",

abstract = "Diamond-like carbon (DLC) films are deposited on AISI 304 stainless steel substrates using hollow cathode chemical vapor deposition (CVD). The substrate bias voltage is varied from 0 to -200 V to investigate its effect on the structural and mechanical properties of the films. Raman spectra show the formation of the G (graphite) peak and D (disorder) peak in the films. X-ray photoelectron spectroscopy (XPS) data also confirm the existence of C=C (sp2) and C-C (sp3) bonds. Our experiments show that the sample bias has a critical influence on the thickness and hardness of the deposited films. The largest thickness (1700 nm) and the highest hardness (HV1099) are achieved at a bias voltage of -50 V. All the films show low friction coefficients and the sample treated at -200 V exhibits the lowest friction coefficient. The enhancement mechanism is also described.",

keywords = "Diamond-like carbon",

author = "Jiang, \{H. F.\} and Tian, \{X. B.\} and Yang, \{S. Q.\} and Fu, \{R. K. Y.\} and Chu, \{Paul K.\}",

year = "2008",

month = jun,

day = "15",

doi = "10.1109/PLASMA.2008.4590718",

language = "English",

pages = "179",

booktitle = "Proceedings of the 35th IEEE International Conference on Plasma Science (ICOPS 2008)",

note = "35th IEEE International Conference on Plasma Science (ICOPS 2008) ; Conference date: 15-06-2008 Through 19-06-2008",

}

Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source. / Jiang, H. F.; Tian, X. B.; Yang, S. Q. et al.
Proceedings of the 35th IEEE International Conference on Plasma Science (ICOPS 2008). 2008. p. 179.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source

AU - Jiang, H. F.

AU - Tian, X. B.

AU - Yang, S. Q.

AU - Fu, R. K. Y.

AU - Chu, Paul K.

PY - 2008/6/15

Y1 - 2008/6/15

N2 - Diamond-like carbon (DLC) films are deposited on AISI 304 stainless steel substrates using hollow cathode chemical vapor deposition (CVD). The substrate bias voltage is varied from 0 to -200 V to investigate its effect on the structural and mechanical properties of the films. Raman spectra show the formation of the G (graphite) peak and D (disorder) peak in the films. X-ray photoelectron spectroscopy (XPS) data also confirm the existence of C=C (sp2) and C-C (sp3) bonds. Our experiments show that the sample bias has a critical influence on the thickness and hardness of the deposited films. The largest thickness (1700 nm) and the highest hardness (HV1099) are achieved at a bias voltage of -50 V. All the films show low friction coefficients and the sample treated at -200 V exhibits the lowest friction coefficient. The enhancement mechanism is also described.

AB - Diamond-like carbon (DLC) films are deposited on AISI 304 stainless steel substrates using hollow cathode chemical vapor deposition (CVD). The substrate bias voltage is varied from 0 to -200 V to investigate its effect on the structural and mechanical properties of the films. Raman spectra show the formation of the G (graphite) peak and D (disorder) peak in the films. X-ray photoelectron spectroscopy (XPS) data also confirm the existence of C=C (sp2) and C-C (sp3) bonds. Our experiments show that the sample bias has a critical influence on the thickness and hardness of the deposited films. The largest thickness (1700 nm) and the highest hardness (HV1099) are achieved at a bias voltage of -50 V. All the films show low friction coefficients and the sample treated at -200 V exhibits the lowest friction coefficient. The enhancement mechanism is also described.

KW - Diamond-like carbon

U2 - 10.1109/PLASMA.2008.4590718

DO - 10.1109/PLASMA.2008.4590718

M3 - RGC 32 - Refereed conference paper (with host publication)

SP - 179

BT - Proceedings of the 35th IEEE International Conference on Plasma Science (ICOPS 2008)

T2 - 35th IEEE International Conference on Plasma Science (ICOPS 2008)

Y2 - 15 June 2008 through 19 June 2008

ER -

Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source

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