Deposition of conductive Ru and RuO2 thin films employing a pyrazolate complex [Ru(CO)3(3,5-(CF3)2-pz)]2 as the CVD source reagent

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Yi-Hwa Song
  • Yao-Lun Chen
  • Yun Chi
  • Chao-Shiuan Liu
  • Wei-Li Ching
  • Reui-San Chen
  • Ying-Sheng Huang
  • Arthur J. Carty

Detail(s)

Original languageEnglish
Pages (from-to)162-169
Journal / PublicationAdvanced Materials
Volume15
Issue number12
Publication statusPublished - 17 Jun 2003
Externally publishedYes

Abstract

The reaction of Ru3(CO)12 with three equivalent of 3,5-bis(trifluoromethyl) pyrazole [(3,5-(CF3)2-pz)H] at 180 °C produces the double pyrazolate-bridged ruthenium complex [Ru(CO)3(3,5-(CF3)2-pz)]2, (1), in high yield. This ruthenium complex has been characterized by spectroscopic methods, revealing a molecular structure similar to that of the diosmium analogue [Os(CO)3(3,5-(CF3)2-pz)]2. Thermogravimetric analysis (TGA) of complex 1 showed an enhanced volatility compared to the parent carbonyl compound Ru3(CO)12 and the closely related, unsaturated 3,5-di-tert-butyl pyrazole complex (2) [Ru2(CO)5(3,5-t-Bu2-pz)2]. Using complex 1 as the CVD source reagent, ruthenium metal with a preferred (002) orientation can be deposited at 400 °C using H2 as the carrier gas. If, however, O2 is used as the carrier gas, RuO2 thin films with a (101) orientation are obtained. The as-deposited metal thin films were characterized by various surface techniques, as well as by electrical resistivity measurements.

Research Area(s)

  • Carbonyl, Pyrazolate, RuO2, Ruthenium, Thin film

Citation Format(s)

Deposition of conductive Ru and RuO2 thin films employing a pyrazolate complex [Ru(CO)3(3,5-(CF3)2-pz)]2 as the CVD source reagent. / Song, Yi-Hwa; Chen, Yao-Lun; Chi, Yun et al.
In: Advanced Materials, Vol. 15, No. 12, 17.06.2003, p. 162-169.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review