Deposition and properties of a-C: H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method

X. T. Zhou; S. T. Lee; I. Bello; A. C. Cheung; D. S. Chiu; Y. W. Lam; C. S. Lee; K. M. Leung; X. M. He

doi:10.1016/S0257-8972(99)00479-X

Author(s)

X. T. Zhou
S. T. Lee
I. Bello
A. C. Cheung
D. S. Chiu
Y. W. Lam
K. M. Leung
X. M. He

Related Research Unit(s)

Centre of Super-Diamond and Advanced Films

Detail(s)

Original language	English
Pages (from-to)	273-277
Journal / Publication	Surface and Coatings Technology
Volume	123
Issue number	2-3
Publication status	Published - 24 Jan 2000

Link(s)

DOI	DOI https://doi.org/10.1016/S0257-8972(99)00479-X Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0034707771&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(c0ed2fde-6f15-49b3-b302-16b7aa7762a2).html

Abstract

a-C:H films were deposited on polymethyl methacrylate (PMMA) using electron cyclotron resonance (ECR) microwave plasma (MP) decomposition of CH₄ diluted in Ar gas. The effect of substrate on the deposition process, optical properties and structure of the a-C:H films was studied. A transparent polymer-like carbon film formed on PMMA, while a semi-transparent diamond-like carbon (DLC) formed on silicon under the same growth conditions. The a-C:H films grown under certain conditions were found to substantially improve the wear resistance of PMMA substrates. (C) 2000 Elsevier Science S.A. All rights reserved.

Research Area(s)

a-C:H films, Electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD), PMMA

Citation Format(s)

[ RIS ] [ BibTeX ]

Deposition and properties of a-C: H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method. / Zhou, X. T.; Lee, S. T.; Bello, I. et al.
In: Surface and Coatings Technology, Vol. 123, No. 2-3, 24.01.2000, p. 273-277.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Zhou, XT, Lee, ST, Bello, I, Cheung, AC, Chiu, DS, Lam, YW, Lee, CS, Leung, KM & He, XM 2000, 'Deposition and properties of a-C: H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method', Surface and Coatings Technology, vol. 123, no. 2-3, pp. 273-277. https://doi.org/10.1016/S0257-8972(99)00479-X

Zhou, X. T., Lee, S. T., Bello, I., Cheung, A. C., Chiu, D. S., Lam, Y. W., Lee, C. S., Leung, K. M., & He, X. M. (2000). Deposition and properties of a-C: H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method. Surface and Coatings Technology, 123(2-3), 273-277. https://doi.org/10.1016/S0257-8972(99)00479-X

Zhou XT, Lee ST, Bello I, Cheung AC, Chiu DS, Lam YW et al. Deposition and properties of a-C: H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method. Surface and Coatings Technology. 2000 Jan 24;123(2-3):273-277. doi: 10.1016/S0257-8972(99)00479-X

Zhou, X. T. ; Lee, S. T. ; Bello, I. et al. / Deposition and properties of a-C : H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method. In: Surface and Coatings Technology. 2000 ; Vol. 123, No. 2-3. pp. 273-277.

Deposition and properties of a-C : H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method