Delamination and buckling induced by compressive strain in metal thin films

    Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

    1 Citation (Scopus)

    Abstract

    The pattern formation during delamination and buckling in sputter-deposited tungsten thin films under large compressive stresses was investigated. The films were analyzed in situ by a cantilever beam technique, and ex situ by atomic force microscopy (AFM) and focused ion beam. Depending on the magnitude of compressive strain in thin films, different types of buckling patterns were observed. For stresses above a critical value, there was a regime of steady growth in which the incipient blister evolves into a regular sinusoidal-like propagation. At higher strains, the sinusoidal-like wrinkles were developed with constant widths and wavelengths. Some of the wrinkles bifurcated to form branches. With further increase in stress the complicated buckling patches were formed with many irregular lobes. These types of pattern formation have been supported by elastic energy calculations.
    Original languageEnglish
    Title of host publicationResidual Stresses VII, ICRS 7
    Pages655-660
    Volume490-491
    Publication statusPublished - 2005
    Event7th International Conference on Residual Stresses, ICRS-7 - Xi'an, China
    Duration: 14 Jun 200417 Jun 2004

    Publication series

    NameMaterials Science Forum
    Volume490-491
    ISSN (Print)0255-5476

    Conference

    Conference7th International Conference on Residual Stresses, ICRS-7
    Country/TerritoryChina
    CityXi'an
    Period14/06/0417/06/04

    Research Keywords

    • Buckling
    • Delamination
    • Metal thin films
    • Reactive magnetron sputtering
    • Stress

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